Guillaume Rosaz's Location
Geneva, Switzerland
Guillaume Rosaz's Work
- Thin Films and Plasma Applied Physicist @ CERN
- Graduate Process Engineer, Low Yield Analysis @ Intel Corporation
- Doctorant and PhD Student @ CNRS
Guillaume Rosaz's Education
- Université de Grenoble
PhD (Nano-electronics and Nano-Technologies)
2009 - 2012 - Université Joseph Fourier (Grenoble I)
Master 2 (Plasma Physics)
2008 - 2009 - Université Joseph Fourier (Grenoble I)
Master 1 (Physics)
2007 - 2008
- Heriot-Watt University
Bachelor (Physics)
2006 - 2007 - Institut Universitaire de technologie d'Annecy-le-vieux
DUT Mesures Physiques / Physics Measurements Technician Diploma (Spectroscopy, Chemistry, Microscopy, Atomic Physics, Electromagnetism, Optics, Condensed Matter)
2004 - 2006 - Lycée Monge
Baccalaurat (Physique, Sciences de l'ingénieur)
2001 - 2004 - College Notre Dame du Rocher
Brevet des colleges
1996 - 1999
Guillaume Rosaz's Skills
- Nanotechnologie
- Semi-conducteur
- Sputtering
- Nanofabrication
- Plasma Physics
- Dépôt chimique en phase vapeur
- JMP
- Plasma Etch
- Wet Etching
- CVD
Guillaume Rosaz's Summary
Guillaume Rosaz, based in Geneva, Switzerland, is currently a Thin Films and Plasma Applied Physicist at CERN, bringing experience from previous roles at Intel Corporation and CNRS. Guillaume Rosaz holds a 2009 - 2012 PhD in Nano-electronics and Nano-Technologies @ Université de Grenoble. With a robust skill set that includes Nanotechnologie, Semi-conducteur, Sputtering, Nanofabrication, Plasma Physics and more, Guillaume Rosaz contributes valuable insights to the industry. Guillaume Rosaz has 2 emails on RocketReach.
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