Sai Vemula Email & Phone Number
Dry Etch Process Engineer @ Intel Corporation
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Sai Vemula Location
- Portland, OR, US
Sai Vemula Work
- Dry Etch Process Engineer @ (January 2022 - Present)
- Graduate Research Associate @ (September 2015 - January 2021)
- Graduate Research Assistant @ (February 2016 - September 2016)
- Grader @ (September 2015 - February 2016)
- Undergraduate Researcher (Bachelor's Thesis) @ (August 2014 - May 2015)
- Summer Intern @ (May 2014 - July 2014)
Sai Vemula Education
- The Ohio State University
Doctor of Philosophy (Ph.D.) (Mechanical Engineering)
2015-2021 - The Ohio State University
Master of Science - MS (Mechanical Engineering)
2015-2019 - Indian Institute of Technology, Madras
B.Tech.(Honours) (Mechanical Engineering)
2011-2015
Sai Vemula Skills
- Plasma Etching
- Design of Experiments (DOE)
- Process Improvement
- Matlab
- Finite Element Analysis
- Mechanical Testing
- Product Development
- Data Analysis
- Computer-Aided Design (CAD)
- Design of Experiments
- Research
- Programming
- Modeling
- Mechanical Engineering
- Statistics
- Machine Learning
- Abaqus
- CATIA
- SolidWorks
- ANSYS
- Simulink
- PTC Creo
- C++
- R
- Microsoft Excel
- Microsoft Word
- Microsoft PowerPoint
- MongoDB
- Python (Programming Language)
- AutoCAD
- Microsoft Office
- dSPACE
- Motion Capture
- JMP
- Constitutive Modeling
Sai Vemula Summary
- Sai Vemula, based in Portland, OR, US, is currently a Dry Etch Process Engineer at Intel Corporation. Sai Vemula brings experience from previous roles at Department of Mechanical and Aerospace Engineering at The Ohio State University, Dept. of Mechanical and Aerospace Engineering at The Ohio State University and Indian Institute of Technology, Madras. Sai Vemula holds a 2015 - 2021 Doctor of Philosophy (Ph.D.) in Mechanical Engineering @ The Ohio State University. With a robust skill set that includes Plasma Etching, Design of Experiments (DOE), Process Improvement, Matlab, Finite Element Analysis and more. Sai Vemula has 3 emails and 1 mobile phone numbers on RocketReach.
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