Golan Tanami Email
Senior Research And Development Process Engineer @ KYOCERA AVX Components Corporation
Golan Tanami's Location
Jerusalem, Yerushalayim, Israel
Golan Tanami's Work
- Senior Research And Development Process Engineer @ KYOCERA AVX Components Corporation
- Senior R and D Researcher @ Sonovia Ltd
- R and D Project Manager of the Window Films Unit at Avery Dennison Hanita @ Avery Dennison Graphics Solutions
- R and D Project Manager of the Industrial Unit at Avery Dennison Hanita @ Avery Dennison Graphics Solutions
- Materials Science, Teaching Assistant @ Azrieli College of Engineering Jerusalem עזריאלי מכללה אקדמית להנדסה ירושלים
- Materials Engineer @ AVX Corporation
Golan Tanami's Education
- The Hebrew University
Doctor of Philosophy (Ph.D.) (Chemistry, Nano-Composite Materials and Polymers)
2010 - 2014 - The Hebrew University
Master of Science (M.Sc.) (Chemistry; Electrochemistry and Thin Films)
2007 - 2009 - Jerusalem College of Engineering
Bachelor of Science (B.Sc.) (Materials Engineering)
2002 - 2006
- Giva'at Gonen, Jerusalem
High School (Art/Art Studies, General)
1995 - 1998 - Technion - Israel Institute of Technology
DPM (Dynamic Projects Management)
Golan Tanami's Skills
- Materials
- Nanotechnology
- Chemistry
- Materials Science
- Characterization
- Scanning Electron Microscopy
- Nanomaterials
- Microelectronics
- R&D
- Thin Films
Golan Tanami's Summary
Golan Tanami, based in Jerusalem, Yerushalayim, Israel, is currently a Senior Research And Development Process Engineer at KYOCERA AVX Components Corporation, bringing experience from previous roles at Sonovia Ltd., Avery Dennison hanita and Azrieli College of Engineering Jerusalem. Golan Tanami holds a 2010 - 2014 Doctor of Philosophy (Ph.D.) in Chemistry, Nano-Composite Materials and Polymers @ The Hebrew University. With a robust skill set that includes Materials, Nanotechnology, Chemistry, Materials Science, Characterization and more, Golan Tanami contributes valuable insights to the industry. Golan Tanami has 2 emails on RocketReach.
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